Etched ion tracks in amorphous SiO2 characterised by small...

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Nanotechnology 2019 / 03

Etched ion tracks in amorphous SiO2 characterised by small angle X-ray scattering: influence of ion energy and etching conditions

Hadley, Andrea, Notthoff, Christian, Mota-Santiago, Pablo, Hossain, UmmeHabiba, Kirby, Nigel, Toimil Molares, Maria Eugenia, Trautmann, Christina, Kluth, Patrick
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Language:
english
Journal:
Nanotechnology
DOI:
10.1088/1361-6528/ab10c8
Date:
March, 2019
File:
PDF, 890 KB
english, 2019
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