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[IEEE 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Austin, TX (2018.9.24-2018.9.26)] 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Transistor Optimization with Novel Cavity for Advanced FinFET Technology
Lo, Hsien-Ching, Peng, Jianwei, Zhao, Pei, Bazizi, El Mehdi, Hu, Yue, Shi, Yong Jun, Qi, Yi, Vinslava, Alina, Shen, Yan Ping, Hong, Wei, Zang, Hui, Zhang, Xing, Jha, Ashish Kumar, Dou, X., Mun, SeongYear:
2018
Language:
english
DOI:
10.1109/SISPAD.2018.8551703
File:
PDF, 237 KB
english, 2018