Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2018 / 11 Vol. 36; Iss. 6
On the trends and application of pattern density dependent isofocal dose of positive resists for 100 keV electron beam lithography
Lopez, Gerald G., de Villafranca, Glen, Azadi, Mohsen, Metzler, Meredith G., Lister, Kevin, Labella, Michael, Eichfeld, Chad, Belic, Nikola, Hofmann, UlrichVolume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/1.5048206
Date:
November, 2018
File:
PDF, 4.54 MB
english, 2018