On the trends and application of pattern density dependent...

On the trends and application of pattern density dependent isofocal dose of positive resists for 100 keV electron beam lithography

Lopez, Gerald G., de Villafranca, Glen, Azadi, Mohsen, Metzler, Meredith G., Lister, Kevin, Labella, Michael, Eichfeld, Chad, Belic, Nikola, Hofmann, Ulrich
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Volume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/1.5048206
Date:
November, 2018
File:
PDF, 4.54 MB
english, 2018
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