Atomic Layer Deposition for Preparation of Highly Efficient...

Atomic Layer Deposition for Preparation of Highly Efficient Catalysts for Dry Reforming of Methane

Kim, Soong, Cha, Byeong, Saqlain, Shahid, Seo, Hyun, Kim, Young
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Volume:
9
Language:
english
Journal:
Catalysts
DOI:
10.3390/catal9030266
Date:
March, 2019
File:
PDF, 5.44 MB
english, 2019
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