Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4 + CHF3 + O2 Inductively Coupled Plasma
Lee, Junmyung, Kim, Jihun, Efremov, Alexander, Kim, Changmok, Lee, Hyun Woo, Kwon, Kwang-HoLanguage:
english
Journal:
Plasma Chemistry and Plasma Processing
DOI:
10.1007/s11090-019-09973-w
Date:
March, 2019
File:
PDF, 994 KB
english, 2019