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Role of Trimethylboron to Silane Ratio on the Properties of p-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition
Águas, H., Filonovich, S. A., Bernacka-Wojcik, I., Fortunato, E., Martins, R.Volume:
10
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2010.1434
Date:
April, 2010
File:
PDF, 338 KB
english, 2010