Parameter optimization in femtosecond pulsed laser etching...

Optics & Laser Technology 2019 / 08 Vol. 116

Parameter optimization in femtosecond pulsed laser etching of fluorine-doped tin oxide films

Wang, Yi-lun, Li, Bao-jia, Li, Shuang-shuang, Li, Huang, Huang, Li-jing, Ren, Nai-fei
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Volume:
116
Language:
english
Journal:
Optics & Laser Technology
DOI:
10.1016/j.optlastec.2019.03.031
Date:
August, 2019
File:
PDF, 3.83 MB
english, 2019
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