Relationship between Sensitization Distance and Photon Shot...

Relationship between Sensitization Distance and Photon Shot Noise in Line Edge Roughness Formation of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Kozawa, Takahiro, Santillan, Julius Joseph, Itani, Toshiro
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Volume:
30
Year:
2017
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.30.197
File:
PDF, 2.09 MB
2017
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