Relationship between Sensitization Distance and Photon Shot Noise in Line Edge Roughness Formation of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
Kozawa, Takahiro, Santillan, Julius Joseph, Itani, ToshiroVolume:
30
Year:
2017
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.30.197
File:
PDF, 2.09 MB
2017