Effect of furnace annealing on the ferroelectricity of Hf0.5 Zr0.5O2 thin films
Shekhawat, Aniruddh, Walters, Glen, Chung, Ching-Chang, Garcia, Roberto, Liu, Yang, Jones, Jacob, Nishida, Toshikazu, Moghaddam, SaeedVolume:
677
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2019.03.031
Date:
May, 2019
File:
PDF, 2.57 MB
english, 2019