Investigation of the relationship between plasma etching characteristics and microstructures of alumina ceramics for chamber parts
Kasashima, Yuji, Tabaru, Tatsuo, Matsuda, Osamu, Motomura, TaiseiVolume:
58
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/1347-4065/ab022f
Date:
April, 2019
File:
PDF, 1.09 MB
english, 2019