![](/img/cover-not-exists.png)
Process stabilization during reactive high power impulse magnetron sputtering of Ce/Gd target
Rabotkin, S V, Oskirko, V O, Ionov, I V, Semenov, V A, Shipilova, A V, Solovyev, A AVolume:
1115
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/1115/3/032078
Date:
November, 2018
File:
PDF, 509 KB
english, 2018