Selection of ion species suited for channeled implantation...

Japanese Journal of Applied Physics 2019 / 05 Vol. 58; Iss. 5

Selection of ion species suited for channeled implantation to be used in multi-epitaxial growth for SiC superjunction devices

Mochizuki, Kazuhiro, Kosugi, Ryoji, Yonezawa, Yoshiyuki, Okumura, Hajime
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Volume:
58
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/1347-4065/ab08ae
Date:
May, 2019
File:
PDF, 948 KB
english, 2019
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