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[IEEE 2018 IEEE Nanotechnology Symposium (ANTS) - Albany, NY, USA (2018.11.14-2018.11.15)] 2018 IEEE Nanotechnology Symposium (ANTS) - Plasma treatment effect on gate stack electrical properties
Li, Tao, Park, Chanro, Bao, Ruqiang, Watanabe, KojiYear:
2018
Language:
english
DOI:
10.1109/NANOTECH.2018.8653559
File:
PDF, 7 KB
english, 2018