Progress in acetal based deep UV resist.

Journal of Photopolymer Science and Technology 1994 Vol. 7; Iss. 3

Progress in acetal based deep UV resist.

Padmanaban, Munirathna, Kinoshita, Yoshiaki, Kudo, Takanori, Lynch, Thomas, Masuda, Seiya, Nozaki, Yuko, Okazaki, Hiroshi, Pawlowski, Georg, Przybilla, Klaus J., Roeschert, Horst, Spiess, Walter, Sueh
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Volume:
7
Year:
1994
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.7.461
File:
PDF, 489 KB
english, 1994
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