Surface reactions of aminosilane precursors during N 2 plasma‐assisted atomic layer deposition of SiN x
Leick, Noemi, Huijs, Jochem M.M., Ovanesyan, Rafaiel A., Hausmann, Dennis M., Agarwal, SumitLanguage:
english
Journal:
Plasma Processes and Polymers
DOI:
10.1002/ppap.201900032
Date:
April, 2019
File:
PDF, 348 KB
english, 2019