Molecular dynamics simulation of SiC removal mechanism in a...

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Ceramics International 2019 / 4

Molecular dynamics simulation of SiC removal mechanism in a fixed abrasive polishing process

Zhou, Piao, Shi, Xunda, Li, Jun, Sun, Tao, Zhu, Yongwei, Wang, Zikun, Chen, Jiapeng
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Language:
english
Journal:
Ceramics International
DOI:
10.1016/j.ceramint.2019.04.180
Date:
April, 2019
File:
PDF, 1.35 MB
english, 2019
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