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Effect of processing parameters on the deposition rate of Si3N4/Si2N2O by chemical vapor infiltration and the in situ thermal decomposition of Na2SiF6
M.I. Pech-Canul, J.L. de la Peña, A.L. Leal-CruzVolume:
89
Language:
english
Pages:
7
DOI:
10.1007/s00339-007-4153-z
Date:
November, 2007
File:
PDF, 509 KB
english, 2007