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Dynamics of nanoclustering in Te+implanted Si after application of high frequency electromagnetic field and thermal annealing
M. Kalitzova, O.I. Lebedev, G. Zollo, K. Gesheva, E. Vlakhov, Y. Marinov, T. IvanovaVolume:
91
Language:
english
Pages:
5
DOI:
10.1007/s00339-008-4441-2
Date:
June, 2008
File:
PDF, 601 KB
english, 2008