Preparation of SiC Thin Films by Plasma-Enhanced Chemical Vapor Deposition Using Silicon Tetrachloride
Yonekubo, So, Tanaka, Hiroyuki, Kamimura, Kiichi, Onuma, YoshiharuVolume:
115
Year:
1995
Journal:
IEEJ Transactions on Fundamentals and Materials
DOI:
10.1541/ieejfms1990.115.8_770
File:
PDF, 1.23 MB
1995