Role of chamber pressure on crystallinity and composition of silicon films using silane and methane as precursors in hot-wire chemical vapour deposition technique
Madaka, Ramakrishna, Kumari, Juhi, Kanneboina, Venkanna, Jha, Himanshu S., Agarwal, PratimaLanguage:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2019.04.038
Date:
April, 2019
File:
PDF, 775 KB
english, 2019