Tetraallyltin precursor for plasma enhanced atomic layer...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2019 / 05 Vol. 37; Iss. 3

Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization

Muneshwar, Triratna, Barlage, Doug, Cadien, Ken
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Volume:
37
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5091944
Date:
May, 2019
File:
PDF, 898 KB
english, 2019
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