Fermi level depinning in Ti/n-type Ge Schottky junction by the insertion of fluorinated graphene
Liu, Guanyu, Zhang, Miao, Xue, Zhongying, Hu, Xudong, Wang, Tianbo, Han, Xiaowen, Di, ZengfengJournal:
Journal of Alloys and Compounds
DOI:
10.1016/j.jallcom.2019.04.174
Date:
April, 2019
File:
PDF, 2.55 MB
2019