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Role of ionization fraction on the surface roughness, density, and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering, and HiPIMS: An atomistic simulation
Kateb, Movaffaq, Hajihoseini, Hamidreza, Gudmundsson, Jon Tomas, Ingvarsson, SnorriVolume:
37
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5094429
Date:
May, 2019
File:
PDF, 4.26 MB
english, 2019