Deformation mechanisms under nanoscratching of Si: effect...

Materials Research Express 2019 / 05 Vol. 6; Iss. 8

Deformation mechanisms under nanoscratching of Si: effect of scratching speed, load and indenter orientation

Shikimaka, Olga, Prisacaru, Andrian
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Volume:
6
Language:
english
Journal:
Materials Research Express
DOI:
10.1088/2053-1591/ab1a0d
Date:
May, 2019
File:
PDF, 1.36 MB
english, 2019
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