Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2019 / 05 Vol. 37; Iss. 3
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Substrate temperature effect on migration behavior of fluorocarbon film precursors in high-aspect ratio structures
Knoll, Andrew J., Pranda, Adam, Lee, Hoki, Oehrlein, Gottlieb S.Volume:
37
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/1.5092969
Date:
May, 2019
File:
PDF, 2.29 MB
2019