Investigation of etching optimization in capacitively coupled SF 6 –O 2 plasma
Alshaltami, Khaled Ali, Daniels, StephenVolume:
9
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.5066286
Date:
March, 2019
File:
PDF, 1.43 MB
english, 2019