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Line-Edge Roughness Stochastics for 5-nm Pattern Formation in the Extreme Ultraviolet Lithography
Kim, Sang-KonVolume:
19
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2019.16698
Date:
August, 2019
File:
PDF, 6.76 MB
english, 2019