Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers
Phae-ngam, W., Horprathum, M., Chananonnawathorn, C., Lertvanithphol, T., Samransuksamer, B., Songsiriritthigul, P., Nakajima, H., Chaiyakun, S.Language:
english
Journal:
Current Applied Physics
DOI:
10.1016/j.cap.2019.05.002
Date:
May, 2019
File:
PDF, 5.25 MB
english, 2019