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Impacts of interface contaminations on the MoS2 field effect transistors and a modified fabrication process to pursuit better interface quality
Huang, Kailiang, Zhao, Miao, Liu, Xueyuan, Xia, Qingzhen, Liu, HonggangLanguage:
english
Journal:
Nanotechnology
DOI:
10.1088/1361-6528/ab21e2
Date:
May, 2019
File:
PDF, 1.64 MB
english, 2019