Diffusion of hydrogen atoms in silicon layers deposited from molecular beams on dielectric substrates
Chizh, Kirill V., Arapkina, Larisa V., Stavrovsky, Dmitry B., Gaiduk, Peter I., Yuryev, Vladimir A.Volume:
99
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2019.04.014
Date:
August, 2019
File:
PDF, 1.13 MB
english, 2019