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Resist image quality control via acid diffusion constant and/or photodecomposable quencher concentration in the fabrication of 11 nm half-pitch line-and-space patterns using extreme-ultraviolet lithography
Kozawa, Takahiro, Santillan, Julius Joseph, Itani, ToshiroVolume:
57
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.57.056501
Date:
May, 2018
File:
PDF, 674 KB
english, 2018