![](/img/cover-not-exists.png)
Effects of post-metallisation annealing on surface–interfacial and electrical properties of HfO2/Ge stacks modified in situ with SiO2 interfacial layer
Mallem, Kumar, Ju, Minkyu, Narayana, Ashwath, Chodary, Sanchari, Kim, Jaemin, Park, Jinsu, Kim, Seyoun, Lokesh, S V, Ravikumar, M V, Kim, Youngkuk, Cho, Eun-Chel, Yi, JunsinLanguage:
english
Journal:
Materials Research Express
DOI:
10.1088/2053-1591/ab2263
Date:
May, 2019
File:
PDF, 1.50 MB
english, 2019