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Reactive sputter deposition of WO 3 films by using two deposition methods
Yasuda, Yoji, Hoshi, Yoichi, Kobayashi, Shin-ichi, Uchida, Takayuki, Sawada, Yutaka, Wang, Meihan, Lei, HaoVolume:
37
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5092863
Date:
May, 2019
File:
PDF, 2.77 MB
english, 2019