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Properties of Amorphous SiC:O:H Films Prepared by Magnetron Sputtering of Si in CH4 and CO2.
SAITO, Nobuo, NAKAAKI, Isamu, NAKAMURA, Sigeaki, IWATA, Hiromu, YOSHIOKA, Shoji, YAMAGUCHI, TomuoVolume:
44
Year:
2001
Journal:
SHINKU
DOI:
10.3131/jvsj.44.605
File:
PDF, 515 KB
2001