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[AIP The 2000 international conference on characterization and metrology for ULSI technology - Gaithersburg, Maryland (USA) (26-29 June 2000)] AIP Conference Proceedings - Electrical characterization of ultra-thin oxides and high K gate dielectrics
Hillard, Robert J.Volume:
550
Year:
2001
Language:
english
DOI:
10.1063/1.1354380
File:
PDF, 1.18 MB
english, 2001