Photoelectric Dual Control Negative Differential Resistance...

IEEE Photonics Journal 2019 / 6 Vol. 11; Iss. 3

Photoelectric Dual Control Negative Differential Resistance Device Fabricated by Standard CMOS Process

Cong, Jia, Mao, Luhong, Xie, Sheng, Zhao, Fan, Yan, Dong, Guo, Weilian
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Volume:
11
Language:
english
Journal:
IEEE Photonics Journal
DOI:
10.1109/JPHOT.2019.2910130
Date:
June, 2019
File:
PDF, 40 KB
english, 2019
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