Thermal atomic layer deposition of metallic Ru using H2O as a reactant
Nguyen, Chi Thang, Yoon, Jaehong, Khan, Rizwan, Shong, Bonggeun, Lee, Han-Bo-RamLanguage:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2019.05.242
Date:
May, 2019
File:
PDF, 1.50 MB
english, 2019