Electron beam metrology for advanced technology nodes
Lorusso, Gian Francesco, Horiguchi, Naoto, Bömmels, Jürgen, Wilson, Christopher J., bosch, Geert Van den, Kar, Gouri Sankar, Ohashi, Takeyoshi, Sutani, Takumichi, Watanabe, Ryota, Takemasa, Yoshikata,Volume:
58
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/1347-4065/ab1475
Date:
June, 2019
File:
PDF, 3.07 MB
english, 2019