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Journal of Materials Science & Technology 2019 / 5

Ta-doped modified Gd2O3 film for a novel high dielectric constant k gate dielectric

Li, Shuan, Wu, Yanqing, Li, Guoling, Yu, Hongen, Fu, Kai, Wu, Yong, Zheng, Jie, Tian, Wenhuai, Li, Xingguo
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Language:
english
Journal:
Journal of Materials Science & Technology
DOI:
10.1016/j.jmst.2019.05.028
Date:
May, 2019
File:
PDF, 1.14 MB
english, 2019
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