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[ACM Press the 56th Annual Design Automation Conference 2019 - Las Vegas, NV, USA (2019.06.02-2019.06.06)] Proceedings of the 56th Annual Design Automation Conference 2019 on - DAC '19 - Process, Circuit and System Co-optimization of Wafer Level Co-Integrated FinFET with Vertical Nanosheet Selector for STT-MRAM Applications
Huynh-Bao, Trong, Furnemont, Arnaud, Kar, Gouri, Mocuta, Anda, Veloso, Anabela, Sakhare, Sushil, Matagne, Philippe, Ryckaert, Julien, Perumkunnil, Manu, Crotti, Davide, Yasin, Farrukh, Spessot, AlessiYear:
2019
Language:
english
DOI:
10.1145/3316781.3317886
File:
PDF, 3.14 MB
english, 2019