Plasma-based sources of extreme ultraviolet radiation for...

Physics Uspekhi 2019 / 03 Vol. 62; Iss. 3

Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences)

Abramenko, D B, Antsiferov, P S, Astakhov, D I, Vinokhodov, A Yu, Vichev, I Yu, Gayasov, R R, Grushin, A S, Dorokhin, L A, Ivanov, V V, Kim, D A, Koshelev, K N, Krainov, P V, Krivokorytov, M S, Krivts
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Volume:
62
Language:
english
Journal:
Physics-Uspekhi
DOI:
10.3367/UFNe.2018.06.038447
Date:
March, 2019
File:
PDF, 1.14 MB
english, 2019
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