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Atomic layer deposition of stoichiometric In 2 O 3 films using liquid ethylcyclopentadienyl indium and combinations of H 2 O and O 2 plasma
Mizutani, Fumikazu, Higashi, Shintaro, Inoue, Mari, Nabatame, ToshihideVolume:
9
Journal:
AIP Advances
DOI:
10.1063/1.5081727
Date:
April, 2019
File:
PDF, 1.58 MB
2019