Growth and thermal annealing for acceptor activation of...

Applied Surface Science 2019 / 09 Vol. 488

Growth and thermal annealing for acceptor activation of p-type (Al)GaN epitaxial structures: Technological challenges and risks

Zlotnik, Sebastian, Sitek, Jakub, Rosiński, Krzysztof, Michałowski, Paweł P., Gaca, Jarosław, Wójcik, Marek, Rudziński, Mariusz
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Volume:
488
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2019.05.306
Date:
September, 2019
File:
PDF, 2.00 MB
english, 2019
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