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Gas-phase chemistry and etching mechanism of SiNx thin films in C4F8 + Ar inductively coupled plasma
Lim, Nomin, Efremov, Alexander, Kwon, Kwang-HoLanguage:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2019.05.066
Date:
May, 2019
File:
PDF, 923 KB
english, 2019