Chemical vapor deposition of titanium nitride thin films:...

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CrystEngComm 2019

Chemical vapor deposition of titanium nitride thin films: kinetics and experiments

Su, Juan, Boichot, R., Blanquet, Elisabeth, Mercier, Frederic, Pons, Michel
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Year:
2019
Language:
english
Journal:
CrystEngComm
DOI:
10.1039/c9ce00488b
File:
PDF, 1.24 MB
english, 2019
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