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Bipolar high power impulse magnetron sputtering for energetic ion-bombardment during TiN thin film growth without the use of a substrate bias
Viloan, Rommel Paulo B., Gu, Jiabin, Boyd, Robert, Keraudy, Julien, Li, Liuhe, Helmersson, UlfLanguage:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2019.05.069
Date:
June, 2019
File:
PDF, 485 KB
english, 2019