Evolution of morphology and crystalline quality of DC-sputtered AlN films with high-temperature annealing
Mogami, Yosuke, Motegi, Shogo, Osawa, Atsushi, Osaki, Kazuto, Tanioka, Yukitake, Maeoka, Atsushi, Jo, Masafumi, Maeda, Noritoshi, Yaguchi, Hiroyuki, Hirayama, HidekiVolume:
58
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/1347-4065/ab1066
Date:
June, 2019
File:
PDF, 675 KB
2019