![](/img/cover-not-exists.png)
Auto-Masked Surface Texturing of Kerf-Loss Free Silicon Wafers Using Hexafluoroisopropanol in a Capacitively Coupled Plasma Etching System
Kim, Suhyun, Park, Jin-Su, Kim, Jun-Hyun, Kim, Chang-Koo, Kim, JihyunVolume:
8
Year:
2019
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0091904jss
File:
PDF, 485 KB
2019