Reliability of scalable MoS2 FETs with 2 nm crystalline...

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Reliability of scalable MoS2 FETs with 2 nm crystalline CaF2 insulators

Illarionov, Yury, Banshchikov, Alexander G., Polyushkin, Dmitry K., Wachter, Stefan, Knobloch, Theresia, Thesberg, Mischa, Vexler, Mikhail I., Waltl, Michael, Lanza, Mario, Sokolov, Nikolai S., Muelle
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Language:
english
Journal:
2D Materials
DOI:
10.1088/2053-1583/ab28f2
Date:
June, 2019
File:
PDF, 1.21 MB
english, 2019
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