Reliability of scalable MoS2 FETs with 2 nm crystalline CaF2 insulators
Illarionov, Yury, Banshchikov, Alexander G., Polyushkin, Dmitry K., Wachter, Stefan, Knobloch, Theresia, Thesberg, Mischa, Vexler, Mikhail I., Waltl, Michael, Lanza, Mario, Sokolov, Nikolai S., MuelleLanguage:
english
Journal:
2D Materials
DOI:
10.1088/2053-1583/ab28f2
Date:
June, 2019
File:
PDF, 1.21 MB
english, 2019