Stochastic simulation of pattern formation for chemically...

Japanese Journal of Applied Physics 2019 / 06 Vol. 58; Iss. SD

Stochastic simulation of pattern formation for chemically amplified resist in electron beam lithography

Koyama, Masanori, Shirai, Masamitsu, Kawata, Hiroaki, Hirai, Yoshihiko, Yasuda, Masaaki
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Volume:
58
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/1347-4065/ab0acd
Date:
June, 2019
File:
PDF, 1.17 MB
2019
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